X-ray laboratory<br/>Diffractometers for powder and thin film diffraction
The Inorganic chemistry research program has the most advanced x-ray laboratory for powder and thin film diffraction in Sweden. Powder diffraction is used for phase and structure analyses, additional cambers for high and low temperature in-situ investigations are also available.
Grazing incidence XRD (GIXRD) are used to enhance the diffraction from surface layers. Many thin films contains texture and residual stress, by using poly capillary x-ray optics, high intensity can be obtained for this type of measurements. Epitaxial films can be characterized with respect of cell parameter and stress with “reciprocal space mapping”.
The laboratory is also used as Ångström laboratory common resource. We also perform commissioned analyzers for external companies/organizations.
Contact person: Mikael Ottosson
Two θ-θ Bragg-Brentano instruments for powders and thin films, used also for x-ray reflectivity (XRR). One θ-2θ instrument with parallel beam and Göbels mirrors, excellent for Grazing Incidence Diffraction from thin films.
Bruker D8 with Kaα1 monocromator and Lynxeye PSD detector. For high resolution powder diffraction with sample changer and optional high and low temperature stages.
Bruker TwinTwin with Lynxeye XE PSD detector for fast measurements with Bragg-Brentano geometry. This system has a state of the art detector yielding very fast measurements with energy resolution. The system can also be configurated to parallel beam geometry.
Thin film diffractometer with motorized sample stage. The system has a fast Lynxeye PDS detector and “easy to change” optics. The main use is Phase mapping, GIXRD and XRR .
The most advance instruments with excellent flexibility for investigations of thin films. A large sections of measurements possible with low and medium resolution.
GIXRD, XRR, Reciprocal space mapping (RSM), texture and stress measurements.
Energy dispersive X-ray fluorescence spectrometer, Polarised EDXRF. The system is primary used to measure thickness and composition in thin films.