Philips MRD I
A very flexible set-up with easy to change optical components (PAN prefix system) with a ½ circle cradle. This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for thin film measurements with low and medium resolution with several high intensity optical components.
Primary optics both point and line focus possible:
Point focus optics:
- Slit systems
- X-ray lens for high intensity texture, stress measurements
Line focus optics:
- Programmable slit
- Ni/C x-ray mirror (0.03º in beam divergence)
- Hybrid monochromator yielding pure CuKα1 radiation
Secondary optics:
- Programmable slits
- Pixcel 3D area detecor
- Parallel plate sollers (0.09, 0.18 and 0.27º) with monochromator
- Detector x-ray mirror (Ni/C)
- 2-bounce analyzer
Motorized x,y,z, PSI and PHI for sample alignment
Possible measurements:
- Very fast θ-2θ scans
- Reciprocal space mapping (RSM) for epitaxial thin films.
- Texture
- Stress
- GIXRD/XRR

Philips MRD II
A very flexible set-up with PAN prefix system and a ½ circle cradle. This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for Grazing Incidence Diffraction (GIXRD) and XRR .
Primary optic line focus:
- X-ray mirror (0.05º in beam divergence)
- Beam attenuator
- Sollers
Secondary optics:
- Programmable slits (only for calibration)
- Parallel plate sollers ( 0.09º)
- Parallel plate sollers ( 0.27º)
- Parallel plate sollers ( 0.27º) with monochromator
Motorized x,y,z, PSI and PHI for sample alignment
