Philips MRD I

A very flexible set-up with easy to change optical components (PAN prefix system) with a ½ circle cradle.  This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for thin film measurements with low and medium resolution with several high intensity optical components.

Primary optics both point and line focus possible:

Point focus optics:

1. Slit systems
2. X-ray lens for high intensity texture, stress measurements

Line focus optics:

1. Programmable slit
2. Ni/C x-ray mirror (0.03º in beam divergence)
3. Hybrid monochromator yielding pure CuKα1 radiation

Secondary optics:

1. Programmable slits
2. Pixcel 3D area detecor
3. Parallel plate sollers (0.09, 0.18 and 0.27º) with monochromator
4. Detector x-ray mirror (Ni/C)
5. 2-bounce analyzer

Motorized x,y,z, PSI and PHI for sample alignment

Possible measurements:

• Very fast  θ-2θ scans
• Reciprocal space mapping (RSM) for epitaxial thin films.
• Texture
• Stress
• GIXRD/XRR

A very flexible set-up with PAN prefix system and a ½ circle cradle.  This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for Grazing Incidence Diffraction (GIXRD) and XRR .

Primary optic line focus:

• X-ray mirror (0.05º in beam divergence)
• Beam attenuator
• Sollers

Secondary optics:

• Programmable slits (only for calibration)
• Parallel plate sollers ( 0.09º)
• Parallel plate sollers ( 0.27º)
• Parallel plate sollers ( 0.27º) with monochromator

Motorized x,y,z, PSI and PHI for sample alignment