Philips MRD I

A very flexible set-up with easy to change optical components (PAN prefix system) with a ½ circle cradle.  This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for thin film measurements with low and medium resolution with several high intensity optical components.

Primary optics both point and line focus possible:

Point focus optics:

  1. Slit systems
  2. X-ray lens for high intensity texture, stress measurements

Line focus optics:

  1. Programmable slit
  2. Ni/C x-ray mirror (0.03º in beam divergence)
  3. Hybrid monochromator yielding pure CuKα1 radiation

Secondary optics:

  1. Programmable slits
  2. Pixcel 3D area detecor
  3. Parallel plate sollers (0.09, 0.18 and 0.27º) with monochromator
  4. Detector x-ray mirror (Ni/C)
  5. 2-bounce analyzer

Motorized x,y,z, PSI and PHI for sample alignment

Possible measurements:

  • Very fast  θ-2θ scans
  • Reciprocal space mapping (RSM) for epitaxial thin films.
  • Texture
  • Stress
  • GIXRD/XRR

Philips MRD II

A very flexible set-up with PAN prefix system and a ½ circle cradle.  This is a “parallel beam” system eliminating all focusing errors associated the focusing systems like Bragg-Brentano. The system is primary designed for Grazing Incidence Diffraction (GIXRD) and XRR .

Primary optic line focus:

  • X-ray mirror (0.05º in beam divergence)
  • Beam attenuator
  • Sollers

Secondary optics:

  • Programmable slits (only for calibration)
  • Parallel plate sollers ( 0.09º)
  • Parallel plate sollers ( 0.27º)
  • Parallel plate sollers ( 0.27º) with monochromator

Motorized x,y,z, PSI and PHI for sample alignment

Last modified: 2021-06-16